Abstract
Recent trend of miniaturization has emphasized the importance of thin films. This has led to development of various methods of thin film deposition. In this paper, Sol-Gel method of thin film deposition is discussed. It is a chemical method and does not require heavy or expensive equipments for thin films deposition. Moreover, it provides easy compositional control and modification, excellent control of stoichiometry, room temperature deposition with relatively low annealing temperature and possibility of film deposition on large area substrates. Interestingly, sol-gel method is being extensively used in preparing nano-particles of various compounds. Thin films, nano-particles, ceramics prepared by this method find industrial applications.